Which of the one between silicon and germanium preferred in the manufacturing of semiconductor devices? Why?
Asked by Topperlearning User | 4th Jun, 2014, 01:23: PM
Silicon is preferred to germanium in the manufacture of semiconductor devices (e.g. semiconductor diode, transistor, etc.) due to the following reasons:-
(i) The leakage current in silicon is very small as compared to that of germanium.
(ii) The working temperature of silicon is more than that of germanium. The structure of germanium will be destroyed at a temperature of about 1000C. However silicon can be operated up to about 2000C.
Answered by | 4th Jun, 2014, 03:23: PM
- Why do conductors not form holes?
- How does the addition of trivalent impurity to a pure semiconductor affect the electron hole pairs at room temperature?
- For the same degree of doping, why is the conductivity of n-type semiconductor greater than that of p-type semiconductor?
- Why is a semiconductor virtually an insulator at room temperature?
- Why are germanium and silicon preferred to other semiconductors in solid state devices?
- Why are n-type and p-type semiconductor electrically neutral?
- Why do hole carriers present in n-type semiconductor?
- Why is the amount of impurity added to a pure semiconductor closely controlled?
- The hole current is due to the movement of valence electrons from one covalent bond to another. Why is then the name hole current?
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